Polysilicon Substrates

Polysilicon is also known to be more resistive compared to single-crystal silicon. Common dopants for polysilicon are boron, arsenic, and phosphorous. The dopants are introduced after deposition. Polysilicon can be doped 3 ways: in-situ doping, diffusion, and ion implantation Polysilicon Substrates.

For more: http://www.globalepisteme.org/Conference/material-science-conference

For abstract submission: http://www.globalepisteme.org/Conference/material-science-conference/submitabstract


Contact us: materials@globalepisteme.com